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High Performance Electrical & Optical Interconnects

Jyoti Kedia, Dr. Neena Gupta

Abstract


With scaling technologies ranging from 180nm to 35 nm the magnitude of interconnects problem has increased manifold. The global wires are much more affected as compared to the local and semi global interconnects. In this paper the high performance interconnects has been investigated. The effect of scaling of dimensions on interconnection in VLSICs has been examined. The comparison of underlying physics of electrical and optical interconnects has been done along with the requirements of optical devices for optics to solve the problems of interconnects in future.

Keywords


Scaling, Copper Interconnects, Low K Dielectrics, Optical Interconnects

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References


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